Abstract:
Abstract. For deposition of hard coatings is used a source of metal atoms accompanied by highenergy
gas atoms. The metal atoms are produced due to sputtering a flat rectangular target in low
pressure magnetron discharge. The gas atoms with energy up to 30 keV are produced due to charge
exchange collisions of accelerated ions in space charge sheaths near the surfaces of a grid parallel to
the target. The ions are extracted from the discharge plasma and accelerated by high-voltage pulses
applied to the grid. The metal atoms pass through the grid and deposit on the products. Conjunction
of their trajectories with those of gas atoms bombarding the growing coating allows synthesis of the
coatings on rotating dielectric products. Mixing by high-energy gas atoms of the coating atoms and
atoms of the product material in its surface layer improves the coating adhesion.
