Seitkulov, A.R.; Grigoriev, S.N.; Metel, A.S.; Volosova, M.A.; Melnik, Y.A.
(ATU, 2016)
Abstract. For deposition of hard coatings is used a source of metal atoms accompanied by highenergy
gas atoms. The metal atoms are produced due to sputtering a flat rectangular target in low
pressure magnetron discharge. ...